Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

This file type includes high-resolution graphics and schematics when applicable. Michael White, Director of Product Marketing, Calibre Physical Verification products, Mentor Graphics In recent years, ...

A lithographic (litho) hotspot is a defect on a wafer that is created during manufacturing by a combination of systematic process variation and resolution enhancement technology (RET) limitations.

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

In VLSI layout design, density issues are critical factors influencing the performance, yield, and reliability of integrated circuits. This whitepaper delves into the several types of density issues, ...

Get started with using GWT-friendly CSS media queries and multi-device layout patterns to develop mobile-responsive web applications. Demonstrations are based on an open source code base that you can ...

The self-assembly of block copolymer thin films can generate dense nanoscale patterns over large areas 1,2,3,4,5,6,7,8. When directed by a sparse topographic or chemical template, the block copolymers ...